ProfileOfResearchers

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112

TITLE: Calculated plasma parameters and excitation spectra of high-pressure helium discharges Full Text
AUTHORS: Peres, I; Alves, LL ; Margot, J; Sadi, T; Ferreira, CM ; Tran, KC; Hubert, J;
PUBLISHED: 1999, SOURCE: PLASMA CHEMISTRY AND PLASMA PROCESSING, VOLUME: 19, ISSUE: 4

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CrossRef: 15

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113

TITLE: Calculation of spatially inhomogeneous electron distribution functions
AUTHORS: Alves, LL ; Gousset, G; Ferreira, CM;
PUBLISHED: 1998, SOURCE: Proceedings of the 1997 3rd International Workshop on Microwave Discharges: Fundamentals and Applications in Journal De Physique. IV : JP, VOLUME: 8, ISSUE: 7

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114

TITLE: Two-dimensional modelling of SiH4-H-2 radio-frequency discharges for a-Si : H deposition
AUTHORS: Leroy, O; Gousset, G; Alves, LL ; Perrin, J; Jolly, J;
PUBLISHED: 1998, SOURCE: PLASMA SOURCES SCIENCE & TECHNOLOGY, VOLUME: 7, ISSUE: 3

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115

TITLE: Nonlocal electron kinetics in DC discharges
AUTHORS: Alves, LL ; Gousset, G; Ferreira, CM ;
PUBLISHED: 1997, SOURCE: XXIIIrd International Conference on Phenomena in Ionized Gases in JOURNAL DE PHYSIQUE IV, VOLUME: 7, ISSUE: C4

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116

TITLE: Self-contained solution to the spatially inhomogeneous electron Boltzmann equation in a cylindrical plasma positive column
AUTHORS: Alves, LL ; Gousset, G; Ferreira, CM ;
PUBLISHED: 1997, SOURCE: PHYSICAL REVIEW E, VOLUME: 55, ISSUE: 1

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117

TITLE: A COLLISIONAL-RADIATIVE MODEL FOR MICROWAVE DISCHARGES IN HELIUM AT LOW AND INTERMEDIATE PRESSURES
AUTHORS: ALVES, LL ; GOUSSET, G; FERREIRA, CM ;
PUBLISHED: 1992, SOURCE: JOURNAL OF PHYSICS D-APPLIED PHYSICS, VOLUME: 25, ISSUE: 12

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118

TITLE: A collisional-radiative model for microwave discharges in helium at low and intermediate pressures
AUTHORS: Alves, LL ; Gousset, G; Ferreira, CM;
PUBLISHED: 1992, SOURCE: Journal of Physics D: Applied Physics - J. Phys. D: Appl. Phys., VOLUME: 25, ISSUE: 12

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119

TITLE: Electron kinetics in weakly ionized helium under DC and HF applied electric fields
AUTHORS: Alves, LL ; Ferreira, CM;
PUBLISHED: 1991, SOURCE: Journal of Physics D: Applied Physics - J. Phys. D: Appl. Phys., VOLUME: 24, ISSUE: 4

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