Pedro Miguel Félix Brogueira


AuthID: R-000-EZ3

Confirmed Publications: 98



81
TITLE: Mobility-lifetime product in microdoped amorphous silicon deposited by hot-wipe chemical vapor deposition  Full Text
AUTHORS: Conde, JP ; Castanha, R; Brogueira, P ; Chu, V ;
PUBLISHED: 1998, SOURCE: 17th International Conference on Amorphous and Microcrystalline Semiconductors - Science and Technology (ICAMS 17) in JOURNAL OF NON-CRYSTALLINE SOLIDS, VOLUME: 227, ISSUE: PART 1
INDEXED IN: Scopus WOS CrossRef
IN MY: ORCID | ResearcherID
82
TITLE: QCD structure of multiparticle production: quark and gluon jets
AUTHORS: Brogueira, P ; de Deus, JD ; da Silva, IP;
PUBLISHED: 1998, SOURCE: EUROPEAN PHYSICAL JOURNAL C, VOLUME: 2, ISSUE: 2
INDEXED IN: Scopus WOS CrossRef
IN MY: ORCID | ResearcherID
83
TITLE: Amorphous and microcrystalline silicon deposited by low-power electron-cyclotron resonance plasma-enhanced chemical-vapor deposition
AUTHORS: Conde, JP ; Schotten, V; Arekat, S; Brogueira, P ; Sousa, R; Chu, V ;
PUBLISHED: 1997, SOURCE: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, VOLUME: 36, ISSUE: 1A
INDEXED IN: Scopus WOS CrossRef
IN MY: ORCID | ResearcherID
84
TITLE: Amorphous and microcrystalline silicon films obtained by hot-wire chemical vapour deposition using high filament temperatures between 1900 and 2500 degrees C
AUTHORS: Conde, JP ; Brogueira, P ; Chu, V ;
PUBLISHED: 1997, SOURCE: PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, VOLUME: 76, ISSUE: 3
INDEXED IN: Scopus WOS CrossRef
IN MY: ORCID | ResearcherID
85
TITLE: Amorphous silicon thin-film transistors with a hot-wire active-layer deposited at high growth rate
AUTHORS: Chu, V ; Jarego, J; Silva, H; Silva, T; Boucinha, M; Brogueira, P ; Conde, JP ;
PUBLISHED: 1997, SOURCE: Symposium on Amorphous and Microcrystalline Silicon Technology in AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY - 1997, VOLUME: 467
INDEXED IN: Scopus WOS
IN MY: ORCID | ResearcherID
86
TITLE: Doping of amorphous and microcrystalline silicon films deposited by hot-wire chemical vapor deposition using phosphine and trimethylboron
AUTHORS: Brogueira, P ; Chu, V ; Ferro, AC ; Conde, JP ;
PUBLISHED: 1997, SOURCE: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, VOLUME: 15, ISSUE: 6
INDEXED IN: Scopus WOS CrossRef: 27
IN MY: ORCID | ResearcherID
87
TITLE: Improved mobility of amorphous silicon thin-film transistors deposited by hot-wire chemical vapor deposition on glass substrates  Full Text
AUTHORS: Chu, V ; Jarego, J; Silva, H; Silva, T; Reissner, M; Brogueira, P ; Conde, JP ;
PUBLISHED: 1997, SOURCE: APPLIED PHYSICS LETTERS, VOLUME: 70, ISSUE: 20
INDEXED IN: Scopus WOS CrossRef
IN MY: ORCID | ResearcherID
88
TITLE: Post-deposition annealing and hydrogenation of hot-wire amorphous and microcrystalline silicon films
AUTHORS: Conde, JP ; Brogueira, P ; Chu, V ;
PUBLISHED: 1997, SOURCE: Symposium Q on Advances in Microcrystalline and Nanocrystalline Semiconductors - 1996, at the 1996 MRS Fall Meeting in ADVANCES IN MICROCRYSTALLINE AND NANOCRYSTALLINE SEMICONDUCTORS - 1996, VOLUME: 452
INDEXED IN: Scopus WOS
IN MY: ORCID | ResearcherID
89
90
TITLE: Discrete branching processes, QCD and multiparticle distributions  Full Text
AUTHORS: Brogueira, P ; deDeus, JD; daSilva, IP;
PUBLISHED: 1996, SOURCE: PHYSICS LETTERS B, VOLUME: 389, ISSUE: 3
INDEXED IN: Scopus WOS CrossRef
IN MY: ORCID | ResearcherID
Page 9 of 10. Total results: 98.

A place for researchers and their institutions

Useful Links

Get Help

© 2024 CRACS & Inesc TEC - All Rights Reserved Privacy Policy | Terms of Service