ProfileOfResearchers

922

TITLE: Thin films applied to integrated optical position-sensitive detectors Full Text
AUTHORS: Fortunato, E ; Soares, F; Lavareda, G ; Martins, R ;
PUBLISHED: 1998, SOURCE: 5th European Vacuum Conference (EVC 5) / 10th International Conference on Thin Films (ICTF 10) in THIN SOLID FILMS, VOLUME: 317, ISSUE: 1-2

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923

TITLE: Thin oxide interface layers in a-Si : H MIS structures Full Text
AUTHORS: Fortunato, E ; Malik, A; Martins, R ;
PUBLISHED: 1998, SOURCE: 17th International Conference on Amorphous and Microcrystalline Semiconductors - Science and Technology (ICAMS 17) in JOURNAL OF NON-CRYSTALLINE SOLIDS, VOLUME: 227, ISSUE: PART 2

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924

TITLE: Analysis of front contact heterojunction in a-Si:H one-dimensional position sensitive detectors Full Text
AUTHORS: Topic, M; Smole, F; Furlan, J; Fortunato, E ; Martins, R ;
PUBLISHED: 1997, SOURCE: REVIEW OF SCIENTIFIC INSTRUMENTS, VOLUME: 68, ISSUE: 3

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925

TITLE: Dependence of amorphous silicon solar cell performances on the lateral drift current Full Text
AUTHORS: Martins, R ; Bicho, A; Lavareda, G ; Fortunato, E ;
PUBLISHED: 1997, SOURCE: SOLAR ENERGY MATERIALS AND SOLAR CELLS, VOLUME: 45, ISSUE: 1

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926

TITLE: High sensitivity photochemical sensors based on amorphous silicon
AUTHORS: Fortunato, E ; Malik, A; Seco, A; Macarico, A; Martins, R ;
PUBLISHED: 1997, SOURCE: Symposium on Amorphous and Microcrystalline Silicon Technology in AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY - 1997, VOLUME: 467

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927

TITLE: Highly conductive and highly transparent n-type microcrystalline silicon thin films Full Text
AUTHORS: Martins, R ; Macarico, A; Ferreira, I ; Nunes, R; Bicho, A; Fortunato, E ;
PUBLISHED: 1997, SOURCE: THIN SOLID FILMS, VOLUME: 303, ISSUE: 1-2

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928

TITLE: Improved a-Si:H TFT performance using a-SiXN1-X/a-SiXC1-X stack dielectrics
AUTHORS: Lavareda, G; Fortunato, E ; Carvalho, CN; Martins, R;
PUBLISHED: 1997, SOURCE: Symposium on Flat Panel Display Materials II, at the 1996 MRS Spring Meeting in FLAT PANEL DISPLAY MATERIALS II, VOLUME: 424

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929

TITLE: Role of the deposition parameters in the uniformity of films produced by the plasma-enhanced chemical vapour deposition technique
AUTHORS: Martins, R ; Macarico, A; Ferreira, I ; Fidalgo, J; Fortunato, E ;
PUBLISHED: 1997, SOURCE: PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, VOLUME: 76, ISSUE: 3

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930

TITLE: Role of the gas flow parameters on the uniformity of films produced by PECVD technique
AUTHORS: Martins, R ; Macarico, A; Ferreira, I ; Fortunato, E ;
PUBLISHED: 1997, SOURCE: Symposium on Amorphous and Microcrystalline Silicon Technology in AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY - 1997, VOLUME: 467

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