Rita Jorge de Sousa Costa Pereira
AuthID: R-000-FHC
101
TITLE: Amorphous and microcrystalline silicon deposited by low-power electron-cyclotron resonance plasma-enhanced chemical-vapor deposition
AUTHORS: Conde, JP ; Schotten, V; Arekat, S; Brogueira, P ; Sousa, R; Chu, V ;
PUBLISHED: 1997, SOURCE: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, VOLUME: 36, ISSUE: 1A
AUTHORS: Conde, JP ; Schotten, V; Arekat, S; Brogueira, P ; Sousa, R; Chu, V ;
PUBLISHED: 1997, SOURCE: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, VOLUME: 36, ISSUE: 1A
