Rodrigo Ferrao Paiva Martins
AuthID: R-000-FKV
451
TITLE: PERFORMANCES PRESENTED BY A POSITION-SENSITIVE DETECTOR BASED ON AMORPHOUS-SILICON TECHNOLOGY
AUTHORS: FORTUNATO, E ; VIEIRA, M; CARVALHO, CN ; LAVAREDA, G; MARTINS, R; SOARES, F; FERREIRA, L;
PUBLISHED: 1993, SOURCE: International Symposium on Physical Concepts and Materials for Novel Optoelectronic Device Application 2 in PHYSICAL CONCEPTS AND MATERIALS FOR NOVEL OPTOELECTRONIC DEVICE APPLICATIONS II: INTERNATIONAL SYMPOSIUM, VOLUME: 1985
AUTHORS: FORTUNATO, E ; VIEIRA, M; CARVALHO, CN ; LAVAREDA, G; MARTINS, R; SOARES, F; FERREIRA, L;
PUBLISHED: 1993, SOURCE: International Symposium on Physical Concepts and Materials for Novel Optoelectronic Device Application 2 in PHYSICAL CONCEPTS AND MATERIALS FOR NOVEL OPTOELECTRONIC DEVICE APPLICATIONS II: INTERNATIONAL SYMPOSIUM, VOLUME: 1985
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TITLE: Tailoring defects on amorphous silicon pin devices Full Text
AUTHORS: Martins, R; Fantoni, A; Vieira, M;
PUBLISHED: 1993, SOURCE: Journal of Non-Crystalline Solids, VOLUME: 164-166
AUTHORS: Martins, R; Fantoni, A; Vieira, M;
PUBLISHED: 1993, SOURCE: Journal of Non-Crystalline Solids, VOLUME: 164-166
453
TITLE: Material properties, project design rules and performances of single and dual-axis a-Si:H large area position sensitive detectors Full Text
AUTHORS: Fortunato, E; Vieira, M; Lavareda, G; Ferreira, L; Martins, R;
PUBLISHED: 1993, SOURCE: Journal of Non-Crystalline Solids, VOLUME: 164-166
AUTHORS: Fortunato, E; Vieira, M; Lavareda, G; Ferreira, L; Martins, R;
PUBLISHED: 1993, SOURCE: Journal of Non-Crystalline Solids, VOLUME: 164-166
454
TITLE: <title>Temperature and light-induced degradation effect on a-Si:H photovoltaic PIN device properties</title>
AUTHORS: Manuela Vieira; Elvira Fortunato; Carlos N Carvalho; Guilherme Lavareda; Fernando Soares; Rodrigo Martins;
PUBLISHED: 1993, SOURCE: Physical Concepts and Materials for Novel Optoelectronic Device Applications II
AUTHORS: Manuela Vieira; Elvira Fortunato; Carlos N Carvalho; Guilherme Lavareda; Fernando Soares; Rodrigo Martins;
PUBLISHED: 1993, SOURCE: Physical Concepts and Materials for Novel Optoelectronic Device Applications II
455
TITLE: <title>Performances presented by a position-sensitive detector based on amorphous silicon technology</title>
AUTHORS: Elvira Fortunato; Manuela Vieira; Carlos N Carvalho; Guilherme Lavareda; Rodrigo Martins; Fernando Soares; Luis A A Ferreira;
PUBLISHED: 1993, SOURCE: Physical Concepts and Materials for Novel Optoelectronic Device Applications II
AUTHORS: Elvira Fortunato; Manuela Vieira; Carlos N Carvalho; Guilherme Lavareda; Rodrigo Martins; Fernando Soares; Luis A A Ferreira;
PUBLISHED: 1993, SOURCE: Physical Concepts and Materials for Novel Optoelectronic Device Applications II
456
TITLE: Role of Photodegradation on the \x03C4;Product and Microstructure of the a-Si:H Pin Devices
AUTHORS: Vieira, M; Fortunato, E; Lavareda, G; C.N Carvalho; Martins, R;
PUBLISHED: 1993, SOURCE: MRS Proc. - MRS Proceedings, VOLUME: 297
AUTHORS: Vieira, M; Fortunato, E; Lavareda, G; C.N Carvalho; Martins, R;
PUBLISHED: 1993, SOURCE: MRS Proc. - MRS Proceedings, VOLUME: 297
457
TITLE: Large Area Position Sensitive Detector Based on Amorphous Silicon Technology
AUTHORS: Fortunato, E; Vieira, M; Ferreira, L; C.N Carvalho; Lavareda, G; Martins, R;
PUBLISHED: 1993, SOURCE: MRS Proc. - MRS Proceedings, VOLUME: 297
AUTHORS: Fortunato, E; Vieira, M; Ferreira, L; C.N Carvalho; Lavareda, G; Martins, R;
PUBLISHED: 1993, SOURCE: MRS Proc. - MRS Proceedings, VOLUME: 297
458
TITLE: A thin SiO layer as a remedy for the indium reduction at the In2O3/μc-Si:C:H interface Full Text
AUTHORS: J.M.M de Nijs; Carvalho, C; Santos, M; Martins, R;
PUBLISHED: 1991, SOURCE: Applied Surface Science, VOLUME: 52, ISSUE: 4
AUTHORS: J.M.M de Nijs; Carvalho, C; Santos, M; Martins, R;
PUBLISHED: 1991, SOURCE: Applied Surface Science, VOLUME: 52, ISSUE: 4
459
TITLE: A-Si:H ambipolar diffusion length and effective lifetime measured by flying spot (FST) and spectral photovoltage (SPT) techniques Full Text
AUTHORS: Vieira, M; Martins, R; Fortunato, E; Soares, F; Guimarães, L;
PUBLISHED: 1991, SOURCE: Journal of Non-Crystalline Solids, VOLUME: 137-138
AUTHORS: Vieira, M; Martins, R; Fortunato, E; Soares, F; Guimarães, L;
PUBLISHED: 1991, SOURCE: Journal of Non-Crystalline Solids, VOLUME: 137-138
460
TITLE: Engineering of plasma deposition systems used for producing large area a-Si:H devices Full Text
AUTHORS: Martins, R; Ferreira, I; Carvalho, N; Guimarães, L;
PUBLISHED: 1991, SOURCE: Journal of Non-Crystalline Solids, VOLUME: 137-138
AUTHORS: Martins, R; Ferreira, I; Carvalho, N; Guimarães, L;
PUBLISHED: 1991, SOURCE: Journal of Non-Crystalline Solids, VOLUME: 137-138
