Rui Miguel dos Santos Martins
AuthID: R-000-J8Z
51
TITLE: The influence of substrate temperature and Al mobility on the microstructural evolution of magnetron sputtered ternary Ti-Al-N thin films Full Text
AUTHORS: Beckers, M; Hoglund, C; Baehtz, C; Martins, RMS; Persson, POA; Hultman, L; Moeller, W;
PUBLISHED: 2009, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 106, ISSUE: 6
AUTHORS: Beckers, M; Hoglund, C; Baehtz, C; Martins, RMS; Persson, POA; Hultman, L; Moeller, W;
PUBLISHED: 2009, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 106, ISSUE: 6
IN MY: 
ORCID | 
ResearcherID
ORCID | ResearcherID52
TITLE: IN-SITU STUDY OF THE PREFERENTIAL ORIENTATION OF MAGNETRON SPUTTERED Ni-Ti THIN FILMS AS A FUNCTION OF BIAS AND SUBSTRATE TYPE
AUTHORS: Rui M S Martins; Norbert Schell; Manfred Beckers; Arndt Muecklich; Helfried Reuther; Rui J C Silva; Karimbi K Mahesh; Braz M B Fernandes;
PUBLISHED: 2008, SOURCE: International Conference on Shape Memory and Superelastic Technologies in SMST 2006: PROCEEDINGS OF THE INTERNATIONAL CONFERENCE ON SHAPE MEMORY AND SUPERELASTIC TECHNOLOGIES
AUTHORS: Rui M S Martins; Norbert Schell; Manfred Beckers; Arndt Muecklich; Helfried Reuther; Rui J C Silva; Karimbi K Mahesh; Braz M B Fernandes;
PUBLISHED: 2008, SOURCE: International Conference on Shape Memory and Superelastic Technologies in SMST 2006: PROCEEDINGS OF THE INTERNATIONAL CONFERENCE ON SHAPE MEMORY AND SUPERELASTIC TECHNOLOGIES
INDEXED IN: WOS
WOS IN MY: ResearcherID
ResearcherID53
TITLE: The dependence of the nanostructure of magnetron sputtered Cu-Ag alloy films on composition and temperature
AUTHORS: Pagh P Almtoft; Ejsing, AM; Bottiger, J; Chevallier, J; Schell, N; Martins, RMS;
PUBLISHED: 2007, SOURCE: JOURNAL OF MATERIALS RESEARCH, VOLUME: 22, ISSUE: 4
AUTHORS: Pagh P Almtoft; Ejsing, AM; Bottiger, J; Chevallier, J; Schell, N; Martins, RMS;
PUBLISHED: 2007, SOURCE: JOURNAL OF MATERIALS RESEARCH, VOLUME: 22, ISSUE: 4
IN MY: ORCID | ResearcherID
ORCID | ResearcherID54
TITLE: Nucleation and growth of Ti2AlN thin films deposited by reactive magnetron sputtering onto MgO(111) Full Text
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Muecklich, A; Moeller, W; Hultman, L;
PUBLISHED: 2007, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 102, ISSUE: 7
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Muecklich, A; Moeller, W; Hultman, L;
PUBLISHED: 2007, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 102, ISSUE: 7
IN MY: ORCID | ResearcherID
ORCID | ResearcherID55
TITLE: In-situ study of Ni–Ti thin film growth on a TiN intermediate layer by X-ray diffraction Full Text
AUTHORS: MARTINS, R; SCHELL, N; SILVA, R; PEREIRA, L; MAHESH, K; FERNANDES, F;
PUBLISHED: 2007, SOURCE: Sensors and Actuators B: Chemical, VOLUME: 126, ISSUE: 1
AUTHORS: MARTINS, R; SCHELL, N; SILVA, R; PEREIRA, L; MAHESH, K; FERNANDES, F;
PUBLISHED: 2007, SOURCE: Sensors and Actuators B: Chemical, VOLUME: 126, ISSUE: 1
56
TITLE: The influence of a poly-Si intermediate layer on the crystallization behaviour of Ni-TiSMA magnetron sputtered thin films Full Text
AUTHORS: Martins, RMS; Fernandes, FMB ; Silva, RJC; Pereira, L ; Gordo, PR; Maneira, MJP; Beckers, M; Mucklich, A; Schell, N;
PUBLISHED: 2006, SOURCE: APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, VOLUME: 83, ISSUE: 1
AUTHORS: Martins, RMS; Fernandes, FMB ; Silva, RJC; Pereira, L ; Gordo, PR; Maneira, MJP; Beckers, M; Mucklich, A; Schell, N;
PUBLISHED: 2006, SOURCE: APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, VOLUME: 83, ISSUE: 1
IN MY: ORCID | ResearcherID
ORCID | ResearcherID57
TITLE: Microstructure and nonbasal-plane growth of epitaxial Ti2AlN thin films Full Text
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Mucklich, A; Moller, W; Hultman, L;
PUBLISHED: 2006, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 99, ISSUE: 3
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Mucklich, A; Moller, W; Hultman, L;
PUBLISHED: 2006, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 99, ISSUE: 3
IN MY: ORCID | ResearcherID
ORCID | ResearcherID58
TITLE: Phase stability of epitaxially grown Ti2AlN thin films Full Text
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Muecklich, A; Moeller, W;
PUBLISHED: 2006, SOURCE: APPLIED PHYSICS LETTERS, VOLUME: 89, ISSUE: 7
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Muecklich, A; Moeller, W;
PUBLISHED: 2006, SOURCE: APPLIED PHYSICS LETTERS, VOLUME: 89, ISSUE: 7
IN MY: ORCID | ResearcherID
ORCID | ResearcherID59
TITLE: The influence of the growth rate on the preferred orientation of magnetron-sputtered Ti-Al-N thin films studied by in situ x-ray diffraction Full Text
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Mucklich, A; Moller, W;
PUBLISHED: 2005, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 98, ISSUE: 4
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Mucklich, A; Moller, W;
PUBLISHED: 2005, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 98, ISSUE: 4
IN MY: ORCID | ResearcherID
ORCID | ResearcherID60
TITLE: Influence of the substrate bias on the size and thermal stability of grains in magnetron-sputtered nanocrystalline Ag films
AUTHORS: Almtoft, KP; Bottiger, J; Chevallier, J; Schell, N; Martins, RMS;
PUBLISHED: 2005, SOURCE: JOURNAL OF MATERIALS RESEARCH, VOLUME: 20, ISSUE: 4
AUTHORS: Almtoft, KP; Bottiger, J; Chevallier, J; Schell, N; Martins, RMS;
PUBLISHED: 2005, SOURCE: JOURNAL OF MATERIALS RESEARCH, VOLUME: 20, ISSUE: 4
IN MY: ORCID | ResearcherID
ORCID | ResearcherID