Norbert Schell
AuthID: R-00F-A53
41
TITLE: The influence of the growth rate on the preferred orientation of magnetron-sputtered Ti-Al-N thin films studied by in situ x-ray diffraction Full Text
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Mucklich, A; Moller, W;
PUBLISHED: 2005, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 98, ISSUE: 4
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Mucklich, A; Moller, W;
PUBLISHED: 2005, SOURCE: JOURNAL OF APPLIED PHYSICS, VOLUME: 98, ISSUE: 4
42
TITLE: Influence of the substrate bias on the size and thermal stability of grains in magnetron-sputtered nanocrystalline Ag films
AUTHORS: Almtoft, KP; Bottiger, J; Chevallier, J; Schell, N; Martins, RMS;
PUBLISHED: 2005, SOURCE: JOURNAL OF MATERIALS RESEARCH, VOLUME: 20, ISSUE: 4
AUTHORS: Almtoft, KP; Bottiger, J; Chevallier, J; Schell, N; Martins, RMS;
PUBLISHED: 2005, SOURCE: JOURNAL OF MATERIALS RESEARCH, VOLUME: 20, ISSUE: 4
43
TITLE: In situ x-ray diffraction studies concerning the influence of Al concentration on the texture development during sputter deposition of Ti-Al-N thin films
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Mucklich, A; Moller, W;
PUBLISHED: 2005, SOURCE: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, VOLUME: 23, ISSUE: 5
AUTHORS: Beckers, M; Schell, N; Martins, RMS; Mucklich, A; Moller, W;
PUBLISHED: 2005, SOURCE: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, VOLUME: 23, ISSUE: 5
