Hugo Manuel Brito Águas
AuthID: R-000-61B
91
TITLE: Effect of an interfacial oxide layer in the annealing behaviour of Au/a-Si:H MIS photodiodes Full Text
AUTHORS: Águas, H; Pereira, L; Ferreira, I; A.R Ramos; A.S Viana; Andreu, J; Vilarinho, P; Fortunato, E; Martins, R;
PUBLISHED: 2004, SOURCE: Journal of Non-Crystalline Solids, VOLUME: 338-340
AUTHORS: Águas, H; Pereira, L; Ferreira, I; A.R Ramos; A.S Viana; Andreu, J; Vilarinho, P; Fortunato, E; Martins, R;
PUBLISHED: 2004, SOURCE: Journal of Non-Crystalline Solids, VOLUME: 338-340
92
TITLE: Effect of the tunnelling oxide growth by H2O2 oxidation on the performance of a-Si:H MIS photodiodes Full Text
AUTHORS: Águas, H; Perreira, L; R.J.C Silva; Fortunato, E; Martins, R;
PUBLISHED: 2004, SOURCE: Materials Science and Engineering: B, VOLUME: 109, ISSUE: 1-3
AUTHORS: Águas, H; Perreira, L; R.J.C Silva; Fortunato, E; Martins, R;
PUBLISHED: 2004, SOURCE: Materials Science and Engineering: B, VOLUME: 109, ISSUE: 1-3
93
TITLE: Effect of the tunnelling oxide thickness and density on the performance of MIS photodiodes Full Text
AUTHORS: LGUAS, H;
PUBLISHED: 2004, SOURCE: Thin Solid Films, VOLUME: 451-452
AUTHORS: LGUAS, H;
PUBLISHED: 2004, SOURCE: Thin Solid Films, VOLUME: 451-452
94
TITLE: Effect of the discharge frequency and impedance on the structural properties of polymorphous silicon Full Text
AUTHORS: Águas, H; Raniero, L; Pereira, L; Fortunato, E; Martins, R;
PUBLISHED: 2004, SOURCE: Thin Solid Films, VOLUME: 451-452
AUTHORS: Águas, H; Raniero, L; Pereira, L; Fortunato, E; Martins, R;
PUBLISHED: 2004, SOURCE: Thin Solid Films, VOLUME: 451-452
95
TITLE: Polymorphous Silicon Films Deposited at 27.12 MHz
AUTHORS: Martins, R; Aguas, H; Ferreira, I; Fortunato, E; Lebib, S; Roca i Cabarrocas, P; Guimaraes, L;
PUBLISHED: 2003, SOURCE: Advanced Materials, VOLUME: 15, ISSUE: 24
AUTHORS: Martins, R; Aguas, H; Ferreira, I; Fortunato, E; Lebib, S; Roca i Cabarrocas, P; Guimaraes, L;
PUBLISHED: 2003, SOURCE: Advanced Materials, VOLUME: 15, ISSUE: 24
INDEXED IN: 
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ORCID
ORCID96
TITLE: Polymorphous silicon deposited in large area reactor at 13 and 27 MHz Full Text
AUTHORS: Águas, H; Roca i Cabarrocas, P; Lebib, S; Silva, V; Fortunato, E; Martins, R;
PUBLISHED: 2003, SOURCE: Thin Solid Films, VOLUME: 427, ISSUE: 1-2
AUTHORS: Águas, H; Roca i Cabarrocas, P; Lebib, S; Silva, V; Fortunato, E; Martins, R;
PUBLISHED: 2003, SOURCE: Thin Solid Films, VOLUME: 427, ISSUE: 1-2
97
TITLE: Influence of the deposition pressure on the properties of transparent and conductive ZnO:Ga thin-film produced by r.f. sputtering at room temperature Full Text
AUTHORS: Assunção, V; Fortunato, E; Marques, A; Águas, H; Ferreira, I; M.E.V Costa; Martins, R;
PUBLISHED: 2003, SOURCE: Thin Solid Films, VOLUME: 427, ISSUE: 1-2
AUTHORS: Assunção, V; Fortunato, E; Marques, A; Águas, H; Ferreira, I; M.E.V Costa; Martins, R;
PUBLISHED: 2003, SOURCE: Thin Solid Films, VOLUME: 427, ISSUE: 1-2
98
TITLE: Spectroscopic ellipsometry study of amorphous silicon anodically oxidised Full Text
AUTHORS: Águas, H; Gonçalves, A; Pereira, L; Silva, R; Fortunato, E; Martins, R;
PUBLISHED: 2003, SOURCE: Thin Solid Films, VOLUME: 427, ISSUE: 1-2
AUTHORS: Águas, H; Gonçalves, A; Pereira, L; Silva, R; Fortunato, E; Martins, R;
PUBLISHED: 2003, SOURCE: Thin Solid Films, VOLUME: 427, ISSUE: 1-2
99
TITLE: New challenges on gallium-doped zinc oxide films prepared by r.f. magnetron sputtering Full Text
AUTHORS: Vitor Assunção; Elvira Fortunato; António Marques; Alexandra Gonçalves; Isabel Ferreira; Hugo Águas; Rodrigo Martins;
PUBLISHED: 2003, SOURCE: Thin Solid Films, VOLUME: 442, ISSUE: 1-2
AUTHORS: Vitor Assunção; Elvira Fortunato; António Marques; Alexandra Gonçalves; Isabel Ferreira; Hugo Águas; Rodrigo Martins;
PUBLISHED: 2003, SOURCE: Thin Solid Films, VOLUME: 442, ISSUE: 1-2
100
TITLE: High quality a-Si:H films for MIS device applications Full Text
AUTHORS: Águas, H; Fortunato, E; Silva, V; Pereira, L; Martins, R;
PUBLISHED: 2002, SOURCE: Thin Solid Films, VOLUME: 403-404
AUTHORS: Águas, H; Fortunato, E; Silva, V; Pereira, L; Martins, R;
PUBLISHED: 2002, SOURCE: Thin Solid Films, VOLUME: 403-404
