Hugo Manuel Brito Águas
AuthID: R-000-61B
141
TITLE: Influence of the deposition pressure on the properties of transparent and conductive ZnO:Ga thin-film produced by r.f. sputtering at room temperature Full Text
AUTHORS: Assunção, V; Fortunato, E; Marques, A; Águas, H; Ferreira, I; M.E.V Costa; Martins, R;
PUBLISHED: 2003, SOURCE: Thin Solid Films, VOLUME: 427, ISSUE: 1-2
AUTHORS: Assunção, V; Fortunato, E; Marques, A; Águas, H; Ferreira, I; M.E.V Costa; Martins, R;
PUBLISHED: 2003, SOURCE: Thin Solid Films, VOLUME: 427, ISSUE: 1-2
142
TITLE: Spectroscopic ellipsometry study of amorphous silicon anodically oxidised Full Text
AUTHORS: Águas, H; Gonçalves, A; Pereira, L; Silva, R; Fortunato, E; Martins, R;
PUBLISHED: 2003, SOURCE: Thin Solid Films, VOLUME: 427, ISSUE: 1-2
AUTHORS: Águas, H; Gonçalves, A; Pereira, L; Silva, R; Fortunato, E; Martins, R;
PUBLISHED: 2003, SOURCE: Thin Solid Films, VOLUME: 427, ISSUE: 1-2
143
TITLE: New challenges on gallium-doped zinc oxide films prepared by r.f. magnetron sputtering Full Text
AUTHORS: Vitor Assunção; Elvira Fortunato; António Marques; Alexandra Gonçalves; Isabel Ferreira; Hugo Águas; Rodrigo Martins;
PUBLISHED: 2003, SOURCE: Thin Solid Films, VOLUME: 442, ISSUE: 1-2
AUTHORS: Vitor Assunção; Elvira Fortunato; António Marques; Alexandra Gonçalves; Isabel Ferreira; Hugo Águas; Rodrigo Martins;
PUBLISHED: 2003, SOURCE: Thin Solid Films, VOLUME: 442, ISSUE: 1-2
144
TITLE: Large Area Deposition of Polymorphous Silicon by Plasma Enhanced Chemical Vapor Deposition at 27.12 MHz and 13.56 MHz
AUTHORS: Águas, H; Silva, V; Fortunato, E; Lebib, S; Roca i Cabarrocas, P; Ferreira, I; Guimarães, L; Martins, R;
PUBLISHED: 2003, SOURCE: Jpn. J. Appl. Phys. - Japanese Journal of Applied Physics, VOLUME: 42, ISSUE: Part 1, No. 8
AUTHORS: Águas, H; Silva, V; Fortunato, E; Lebib, S; Roca i Cabarrocas, P; Ferreira, I; Guimarães, L; Martins, R;
PUBLISHED: 2003, SOURCE: Jpn. J. Appl. Phys. - Japanese Journal of Applied Physics, VOLUME: 42, ISSUE: Part 1, No. 8
145
TITLE: Influence of the deposition pressure on the properties of transparent and conductive ZnO: Ga thin-film produced by r.f. sputtering at room temperature Full Text
AUTHORS: Elvira Fortunato; V. Assunção; A. Marques; Hugo Águas; Rodrigo Martins; Costa, M. E. V.;
PUBLISHED: 2003
AUTHORS: Elvira Fortunato; V. Assunção; A. Marques; Hugo Águas; Rodrigo Martins; Costa, M. E. V.;
PUBLISHED: 2003
INDEXED IN: 
Handle
Handle146
TITLE: High quality a-Si:H films for MIS device applications Full Text
AUTHORS: Águas, H; Fortunato, E; Silva, V; Pereira, L; Martins, R;
PUBLISHED: 2002, SOURCE: Thin Solid Films, VOLUME: 403-404
AUTHORS: Águas, H; Fortunato, E; Silva, V; Pereira, L; Martins, R;
PUBLISHED: 2002, SOURCE: Thin Solid Films, VOLUME: 403-404
147
TITLE: Influence of a DC grid on silane r.f. plasma properties Full Text
AUTHORS: Hugo Águas; Elvira Fortunato; Rodrigo Martins;
PUBLISHED: 2002, SOURCE: Vacuum, VOLUME: 64, ISSUE: 3-4
AUTHORS: Hugo Águas; Elvira Fortunato; Rodrigo Martins;
PUBLISHED: 2002, SOURCE: Vacuum, VOLUME: 64, ISSUE: 3-4
148
TITLE: Role of the i layer surface properties on the performance of a-Si:H Schottky barrier photodiodes Full Text
AUTHORS: Águas, H; Fortunato, E; Martins, R;
PUBLISHED: 2002, SOURCE: Sensors and Actuators A: Physical, VOLUME: 99, ISSUE: 1-2
AUTHORS: Águas, H; Fortunato, E; Martins, R;
PUBLISHED: 2002, SOURCE: Sensors and Actuators A: Physical, VOLUME: 99, ISSUE: 1-2
149
TITLE: Thin film metal oxide semiconductors deposited on polymeric substrates
AUTHORS: Fortunato, E; Nunes, P; Marques, A; Costa, D; Aguas, H; Ferreira, I; Costa, MEV; Martins, R;
PUBLISHED: 2001, SOURCE: Transport and Microstructural Phenomena in Oxide Electronics in Materials Research Society Symposium - Proceedings, VOLUME: 666
AUTHORS: Fortunato, E; Nunes, P; Marques, A; Costa, D; Aguas, H; Ferreira, I; Costa, MEV; Martins, R;
PUBLISHED: 2001, SOURCE: Transport and Microstructural Phenomena in Oxide Electronics in Materials Research Society Symposium - Proceedings, VOLUME: 666
INDEXED IN: 
Scopus
Scopus IN MY: 
ORCID
ORCID150
TITLE: Role of ion bombardment on the properties of a-Si:H films Full Text
AUTHORS: Hugo Águas; Martins, R; Fortunato, E;
PUBLISHED: 2001, SOURCE: Vacuum, VOLUME: 60, ISSUE: 1-2
AUTHORS: Hugo Águas; Martins, R; Fortunato, E;
PUBLISHED: 2001, SOURCE: Vacuum, VOLUME: 60, ISSUE: 1-2
