Hugo Manuel Brito Águas
AuthID: R-000-61B
151
TITLE: Influence of the deposition pressure on the properties of transparent and conductive ZnO: Ga thin-film produced by r.f. sputtering at room temperature Full Text
AUTHORS: Elvira Fortunato; V. Assunção; A. Marques; Hugo Águas; Rodrigo Martins; Costa, M. E. V.;
PUBLISHED: 2003
AUTHORS: Elvira Fortunato; V. Assunção; A. Marques; Hugo Águas; Rodrigo Martins; Costa, M. E. V.;
PUBLISHED: 2003
INDEXED IN: 
Handle
Handle152
TITLE: High quality a-Si:H films for MIS device applications Full Text
AUTHORS: Águas, H; Fortunato, E ; Silva, V; Pereira, L ; Martins, R;
PUBLISHED: 2002, SOURCE: Thin Solid Films, VOLUME: 403-404
AUTHORS: Águas, H; Fortunato, E ; Silva, V; Pereira, L ; Martins, R;
PUBLISHED: 2002, SOURCE: Thin Solid Films, VOLUME: 403-404
153
TITLE: Influence of a DC grid on silane r.f. plasma properties Full Text
AUTHORS: Hugo Águas; Elvira Fortunato ; Rodrigo Martins;
PUBLISHED: 2002, SOURCE: Vacuum, VOLUME: 64, ISSUE: 3-4
AUTHORS: Hugo Águas; Elvira Fortunato ; Rodrigo Martins;
PUBLISHED: 2002, SOURCE: Vacuum, VOLUME: 64, ISSUE: 3-4
154
TITLE: Role of the i layer surface properties on the performance of a-Si:H Schottky barrier photodiodes Full Text
AUTHORS: Águas, H; Fortunato, E ; Martins, R;
PUBLISHED: 2002, SOURCE: Sensors and Actuators A: Physical, VOLUME: 99, ISSUE: 1-2
AUTHORS: Águas, H; Fortunato, E ; Martins, R;
PUBLISHED: 2002, SOURCE: Sensors and Actuators A: Physical, VOLUME: 99, ISSUE: 1-2
155
TITLE: Thin film metal oxide semiconductors deposited on polymeric substrates
AUTHORS: Fortunato, E ; Nunes, P; Marques, A; Costa, D; Aguas, H; Ferreira, I; Costa, MEV; Martins, R;
PUBLISHED: 2001, SOURCE: Transport and Microstructural Phenomena in Oxide Electronics in Materials Research Society Symposium - Proceedings, VOLUME: 666
AUTHORS: Fortunato, E ; Nunes, P; Marques, A; Costa, D; Aguas, H; Ferreira, I; Costa, MEV; Martins, R;
PUBLISHED: 2001, SOURCE: Transport and Microstructural Phenomena in Oxide Electronics in Materials Research Society Symposium - Proceedings, VOLUME: 666
INDEXED IN: 
Scopus
Scopus IN MY: 
ORCID
ORCID156
TITLE: New steps to improve a-Si:H device stability by design of the interfaces Full Text
AUTHORS: Rodrigo Martins; Isabel Ferreira; Ana Cabrita; Hugo Águas; Vitor Silva; Elvira Fortunato;
PUBLISHED: 2001, SOURCE: Advanced Engineering Materials, VOLUME: 3, ISSUE: 3
AUTHORS: Rodrigo Martins; Isabel Ferreira; Ana Cabrita; Hugo Águas; Vitor Silva; Elvira Fortunato;
PUBLISHED: 2001, SOURCE: Advanced Engineering Materials, VOLUME: 3, ISSUE: 3
INDEXED IN: Scopus 
CrossRef
Scopus CrossRef157
TITLE: Role of ion bombardment on the properties of a-Si:H films Full Text
AUTHORS: Hugo Águas; Martins, R; Fortunato, E ;
PUBLISHED: 2001, SOURCE: Vacuum, VOLUME: 60, ISSUE: 1-2
AUTHORS: Hugo Águas; Martins, R; Fortunato, E ;
PUBLISHED: 2001, SOURCE: Vacuum, VOLUME: 60, ISSUE: 1-2
158
TITLE: Fast and cheap method to qualitatively measure the thickness and uniformity of ZrO2 thin films Full Text
AUTHORS: Hugo Águas; António Marques; Rodrigo Martins; Elvira Fortunato ;
PUBLISHED: 2001, SOURCE: Materials Science in Semiconductor Processing, VOLUME: 4, ISSUE: 1-3
AUTHORS: Hugo Águas; António Marques; Rodrigo Martins; Elvira Fortunato ;
PUBLISHED: 2001, SOURCE: Materials Science in Semiconductor Processing, VOLUME: 4, ISSUE: 1-3
159
TITLE: Influence of the Plasma Regime on the Structural, Optical, Electrical and Morphological Properties of a-Si:H Thin Films
AUTHORS: Hugo Águas; Rodrigo Martins; Yuri Nunes ; Manuel J.P Maneira; Elvira Fortunato ;
PUBLISHED: 2001, SOURCE: Materials Science Forum, VOLUME: 382
AUTHORS: Hugo Águas; Rodrigo Martins; Yuri Nunes ; Manuel J.P Maneira; Elvira Fortunato ;
PUBLISHED: 2001, SOURCE: Materials Science Forum, VOLUME: 382
160
TITLE: Plasma diagnostics of a PECVD system using different R.F. electrode configurations Full Text
AUTHORS: Águas, H; Martins, R; Fortunato, E ;
PUBLISHED: 2000, SOURCE: Vacuum, VOLUME: 56, ISSUE: 1
AUTHORS: Águas, H; Martins, R; Fortunato, E ;
PUBLISHED: 2000, SOURCE: Vacuum, VOLUME: 56, ISSUE: 1
