41
TITLE: Properties of indium tin oxide films prepared by rf reactive magnetron sputtering at different substrate temperature  Full Text
AUTHORS: Meng, LJ ; dos Santos, MP ;
PUBLISHED: 1998, SOURCE: THIN SOLID FILMS, VOLUME: 322, ISSUE: 1-2
INDEXED IN: Scopus WOS CrossRef
IN MY: ORCID
42
TITLE: Characterization of titanium nitride films prepared by dc reactive magnetron sputtering at different nitrogen pressures  Full Text
AUTHORS: Meng, LJ ; dosSantos, MP;
PUBLISHED: 1997, SOURCE: SURFACE & COATINGS TECHNOLOGY, VOLUME: 90, ISSUE: 1-2
INDEXED IN: Scopus WOS CrossRef
IN MY: ORCID
43
TITLE: Properties of indium tin oxide (ITO) films prepared by rf reactive magnetron sputtering at different pressures  Full Text
AUTHORS: Meng, LJ ; dosSantos, MP;
PUBLISHED: 1997, SOURCE: THIN SOLID FILMS, VOLUME: 303, ISSUE: 1-2
INDEXED IN: Scopus WOS CrossRef
IN MY: ORCID
44
TITLE: Study of the effect of the oxygen partial pressure on the properties of rf reactive magnetron sputtered tin-doped indium oxide films  Full Text
AUTHORS: Meng, LJ ; dos Santos, MP ;
PUBLISHED: 1997, SOURCE: APPLIED SURFACE SCIENCE, VOLUME: 120, ISSUE: 3-4
INDEXED IN: Scopus WOS CrossRef
IN MY: ORCID
45
TITLE: Structure effect on electrical properties of ITO films prepared by RF reactive magnetron sputtering  Full Text
AUTHORS: Meng, LJ ; dosSantos, MP;
PUBLISHED: 1996, SOURCE: THIN SOLID FILMS, VOLUME: 289, ISSUE: 1-2
INDEXED IN: Scopus WOS CrossRef
IN MY: ORCID
46
TITLE: CHARACTERIZATION OF ZNO FILMS PREPARED BY DE REACTIVE MAGNETRON SPUTTERING AT DIFFERENT OXYGEN PARTIAL PRESSURES  Full Text
AUTHORS: MENG, LJ ; DOSSANTOS, MP;
PUBLISHED: 1995, SOURCE: 4th European Vacuum Conference (EVC-4)1st Swedish Vacuum Meeting (SVM-1) in VACUUM, VOLUME: 46, ISSUE: 8-10
INDEXED IN: Scopus WOS
IN MY: ORCID
47
TITLE: DEPOSITION AND PROPERTIES OF TITANIUM NITRIDE FILMS PRODUCED BY DC REACTIVE MAGNETRON SPUTTERING  Full Text
AUTHORS: MENG, LJ ; AZEVEDO, A; DOSSANTOS, MP;
PUBLISHED: 1995, SOURCE: VACUUM, VOLUME: 46, ISSUE: 3
INDEXED IN: Scopus WOS
IN MY: ORCID
48
TITLE: STUDY OF ANNEALED INDIUM TIN OXIDE-FILMS PREPARED BY RF REACTIVE MAGNETRON SPUTTERING  Full Text
AUTHORS: MENG, LJ ; MACARICO, A; MARTINS, R ;
PUBLISHED: 1995, SOURCE: VACUUM, VOLUME: 46, ISSUE: 7
INDEXED IN: Scopus WOS
IN MY: ORCID
49
TITLE: DIRECT-CURRENT REACTIVE MAGNETRON-SPUTTERED ZINC-OXIDE THIN-FILMS - THE EFFECT OF THE SPUTTERING PRESSURE  Full Text
AUTHORS: MENG, LJ ; DOSSANTOS, MP;
PUBLISHED: 1994, SOURCE: THIN SOLID FILMS, VOLUME: 250, ISSUE: 1-2
INDEXED IN: Scopus WOS
IN MY: ORCID
50
TITLE: STUDY OF THE STRUCTURAL-PROPERTIES OF ZNO THIN-FILMS BY X-RAY PHOTOELECTRON-SPECTROSCOPY  Full Text
AUTHORS: MENG, LJ ; DESA, CPM ; DOSSANTOS, MP;
PUBLISHED: 1994, SOURCE: APPLIED SURFACE SCIENCE, VOLUME: 78, ISSUE: 1
INDEXED IN: Scopus WOS
IN MY: ORCID
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