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Luis Manuel dos Santos Redondo
AuthID:
R-000-9KR
Publications
Confirmed
To Validate
Document Source:
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Document Type:
All Document Types
Article (27)
Proceedings Paper (27)
Book Chapter (1)
Editorial Material (1)
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Order:
Year Dsc
Year Asc
Cit. WOS Dsc
IF WOS Dsc
Cit. Scopus Dsc
IF Scopus Dsc
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Title Dsc
Results:
10
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Confirmed Publications: 56
51
TITLE:
Ion implantation of microcrystalline silicon for low process temperature top gate thin film transistors
Full Text
AUTHORS:
Chu, V
; Silva, H;
Redondo, LM
;
Jesus, C
;
Silva, MF
;
Soares, JC
;
Conde, JP
;
PUBLISHED:
1999
,
SOURCE:
THIN SOLID FILMS,
VOLUME:
337,
ISSUE:
1-2
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
52
TITLE:
Analysis of the elements sputtered during the lanthanum implantation in stainless steels
Full Text
AUTHORS:
Ager, FJ;
Respaldiza, MA
; Paul, A; Odriozola, JA; Lobato, JM; da Silva, MF;
Redondo, LM
;
Soares, JC
;
PUBLISHED:
1998
,
SOURCE:
5th European Conference on Accelerators in Applied Research and Technology (ECAART5)
in
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,
VOLUME:
139,
ISSUE:
1-4
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
53
TITLE:
Giant magnetoresistance behavior of granular Fe and Co implanted Ag thin films
AUTHORS:
Soares, JC
;
Redondo, LM
; de Jesus, CM;
Marques, JG
; da Silva, MF; de Azevedo, MMP;
Mendes, JA
; Rogalski, MS;
Sousa, JB
;
PUBLISHED:
1998
,
SOURCE:
44th National Symposium of the American-Vacuum-Society
in
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
VOLUME:
16,
ISSUE:
3
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
54
TITLE:
High flux 56Fe+ and 57Fe+ implantations for GMR applications
Full Text
AUTHORS:
Redondo, LM
; De Jesus, CM;
Marques, JG
; Da Silva, MF;
Soares, JC
; Pereira De Azevedo, MM;
Mendes, JA
; Rogalski, MS;
Sousa, JB
;
PUBLISHED:
1998
,
SOURCE:
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms,
VOLUME:
139,
ISSUE:
1-4
INDEXED IN:
Scopus
IN MY:
ORCID
55
TITLE:
Lattice site location and annealing behavior of W implanted TiO2
Full Text
AUTHORS:
da Silva, RC
;
Alves, E
;
Redondo, LM
;
Fromknecht, R
; Meyer, O;
PUBLISHED:
1998
,
SOURCE:
13th International Conference on Ion Beam Analysis (IBA-13)
in
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS,
VOLUME:
136
INDEXED IN:
Scopus
WOS
CrossRef
IN MY:
ORCID
56
TITLE:
Magnetization and magnetoresistance in Fe-ion-implanted Cu and Ag thin films
Full Text
AUTHORS:
deAzevedo, MMP;
Sousa, JB
;
Mendes, JA
;
Almeida, BG
; Rogalski, MS;
Pogorelov, YG
; Bibicu, I;
Redondo, LM
; daSilva, MF; Jesus, CM;
Marques, JG
;
Soares, JC
;
PUBLISHED:
1997
,
SOURCE:
JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS,
VOLUME:
173,
ISSUE:
3
INDEXED IN:
Scopus
WOS
IN MY:
ORCID
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