Akepati Sivasankar Reddy
AuthID: R-000-V90
1
TITLE: Nanocrystalline Au:Ag:SnO2 films prepared by pulsed magnetron sputtering Full Text
AUTHORS: Sivasankar S Reddy; Figueiredo, NM; Cavaleiro, A ;
PUBLISHED: 2013, SOURCE: JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, VOLUME: 74, ISSUE: 6
AUTHORS: Sivasankar S Reddy; Figueiredo, NM; Cavaleiro, A ;
PUBLISHED: 2013, SOURCE: JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, VOLUME: 74, ISSUE: 6
2
TITLE: Pulsed direct current magnetron sputtered nanocrystalline tin oxide films Full Text
AUTHORS: Sivasankar Reddy, AS; Figueiredo, NM; Cavaleiro, A ;
PUBLISHED: 2012, SOURCE: APPLIED SURFACE SCIENCE, VOLUME: 258, ISSUE: 22
AUTHORS: Sivasankar Reddy, AS; Figueiredo, NM; Cavaleiro, A ;
PUBLISHED: 2012, SOURCE: APPLIED SURFACE SCIENCE, VOLUME: 258, ISSUE: 22
3
TITLE: Effect of annealing temperature on the properties of pulsed magnetron sputtered nanocrystalline Ag:SnO2 films Full Text
AUTHORS: Sivasankar S Reddy; Figueiredo, NM; Cho, HC; Lee, KS; Cavaleiro, A ;
PUBLISHED: 2012, SOURCE: MATERIALS CHEMISTRY AND PHYSICS, VOLUME: 133, ISSUE: 2-3
AUTHORS: Sivasankar S Reddy; Figueiredo, NM; Cho, HC; Lee, KS; Cavaleiro, A ;
PUBLISHED: 2012, SOURCE: MATERIALS CHEMISTRY AND PHYSICS, VOLUME: 133, ISSUE: 2-3
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TITLE: Nanocrystalline SnO2 and Au:SnO2 thin films prepared by direct current magnetron reactive sputtering Full Text
AUTHORS: Sivasankar S Reddy; Figueiredo, NM; Cavaleiro, A ;
PUBLISHED: 2012, SOURCE: VACUUM, VOLUME: 86, ISSUE: 9
AUTHORS: Sivasankar S Reddy; Figueiredo, NM; Cavaleiro, A ;
PUBLISHED: 2012, SOURCE: VACUUM, VOLUME: 86, ISSUE: 9
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TITLE: Effect of substrate bias voltage on the physical properties of dc reactive magnetron sputtered NiO thin films Full Text
AUTHORS: Mallikarjuna M Reddy; Sivasankar S Reddy; Sreedhara S Reddy;
PUBLISHED: 2011, SOURCE: MATERIALS CHEMISTRY AND PHYSICS, VOLUME: 125, ISSUE: 3
AUTHORS: Mallikarjuna M Reddy; Sivasankar S Reddy; Sreedhara S Reddy;
PUBLISHED: 2011, SOURCE: MATERIALS CHEMISTRY AND PHYSICS, VOLUME: 125, ISSUE: 3
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TITLE: Electrical and optical properties of In2O3:Mo thin films prepared at various Mo-doping levels Full Text
AUTHORS: Kaleemulla, S; Madhusudhana M Rao; Girish G Joshi; Sivasankar S Reddy; Uthanna, S; Sreedhara S Reddy;
PUBLISHED: 2010, SOURCE: JOURNAL OF ALLOYS AND COMPOUNDS, VOLUME: 504, ISSUE: 2
AUTHORS: Kaleemulla, S; Madhusudhana M Rao; Girish G Joshi; Sivasankar S Reddy; Uthanna, S; Sreedhara S Reddy;
PUBLISHED: 2010, SOURCE: JOURNAL OF ALLOYS AND COMPOUNDS, VOLUME: 504, ISSUE: 2
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TITLE: Physical properties of In2O3 thin films prepared at various oxygen partial pressures Full Text
AUTHORS: Kaleemulla, S; Sivasankar S Reddy; Uthanna, S; Sreedhara S Reddy;
PUBLISHED: 2009, SOURCE: JOURNAL OF ALLOYS AND COMPOUNDS, VOLUME: 479, ISSUE: 1-2
AUTHORS: Kaleemulla, S; Sivasankar S Reddy; Uthanna, S; Sreedhara S Reddy;
PUBLISHED: 2009, SOURCE: JOURNAL OF ALLOYS AND COMPOUNDS, VOLUME: 479, ISSUE: 1-2
