Comparison of the Mechanical and Resonance Properties of Thin Film Silicon Mems Fabricated at 110 and 250 Degrees C

AuthID
 P-003-NHX
3
Author(s)
·
Document Type
Article
Year published
2009
Published
in JOURNAL OF MICROMECHANICS AND MICROENGINEERING, ISSN: 0960-1317
Volume: 19, Issue: 2, Pages: 025018 (6)
Indexing
Wos®
Scopus®
Crossref®
Google Scholar®
Publication Identifiers
Scopus: 2-s2.0-61849089034
Wos: WOS:000262786300019
Source Identifiers
ISSN: 0960-1317
Export Publication Metadata
Marked List
 Add to Marked List
Info
At this moment we don't have any links to full text documens.

A place for researchers and their institutions

Useful Links

Get Help

© 2024 CRACS & Inesc TEC - All Rights Reserved Privacy Policy | Terms of Service