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Modelling the Low-Pressure N(2)-O(2) Plasma Afterglow to Determine the Kinetic Mechanisms Controlling the Uv Emission Intensity and Its Spatial Distribution for Achieving an Efficient Sterilization Process

AuthID
P-003-TXD

Author(s)

Kutasi, K

Document Type

Article

Year published

2008

Published

in PLASMA PROCESSES AND POLYMERS, ISSN: 1612-8850

Volume: 5, Issue: 9, Pages: 840-852 (13)

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Wos^®

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Publication Identifiers

DOI: 10.1002/ppap.200800085

Scopus: 2-s2.0-60049085603

Wos: WOS:000261300500004

Source Identifiers

ISSN: 1612-8850

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Modelling the Low-Pressure N(2)-O(2) Plasma Afterglow to Determine the Kinetic Mechanisms Controlling the Uv Emission Intensity and Its Spatial Distribution for Achieving an Efficient Sterilization Process

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Modelling the Low-Pressure N(2)-O(2) Plasma Afterglow to Determine the Kinetic Mechanisms Controlling the Uv Emission Intensity and Its Spatial Distribution for Achieving an Efficient Sterilization Process

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