Role of Annealing Environment on the Performances of Large Area Ito Films Produced by Rf Magnetron Sputtering

AuthID
 P-000-1S1
7
Author(s)
Martins, N
·
1
Editor(s)
Nickel N.Werner J.Strunkk H.P.
Document Type
Article
Year published
2005
Published
in THIN SOLID FILMS, ISSN: 0040-6090
Volume: 487, Issue: 1-2, Pages: 271-276 (6)
Conference
8Th International Conference on Polycrystalline Semiconductors, Date: SEP 05-10, 2004, Location: Potsdam, GERMANY
Indexing
Wos®
Scopus®
Crossref®
Google Scholar®
Publication Identifiers
Scopus: 2-s2.0-22944484060
Wos: WOS:000231209900055
Source Identifiers
ISSN: 0040-6090
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