Influence of N(+) and P(+) Doping on the Lattice Sites of Implanted Fe in Si

AuthID
 P-006-7AZ
4
Author(s)
Document Type
Article
Year published
2013
Published
in JOURNAL OF APPLIED PHYSICS, ISSN: 0021-8979
Volume: 114, Issue: 10, Pages: 103503 (9)
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Wos®
Scopus®
Crossref®16
Google Scholar®
Publication Identifiers
Scopus: 2-s2.0-84884911581
Wos: WOS:000324495600012
Source Identifiers
ISSN: 0021-8979
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