Hot-Wire Plasma Assisted Chemical Vapor Deposition: A Deposition Technique to Obtain Silicon Thin Films

AuthID
 P-000-QF8
4
Author(s)
Document Type
Article
Year published
2002
Published
in JOURNAL OF APPLIED PHYSICS, ISSN: 0021-8979
Volume: 91, Issue: 3, Pages: 1644-1649 (6)
Indexing
Wos®
Scopus®
Crossref®1
Google Scholar®
Publication Identifiers
Scopus: 2-s2.0-0036469595
Wos: WOS:000173418500115
Source Identifiers
ISSN: 0021-8979
Export Publication Metadata
Marked List
 Add to Marked List
Info
At this moment we don't have any links to full text documens.

A place for researchers and their institutions

Useful Links

Get Help

© 2024 CRACS & Inesc TEC - All Rights Reserved Privacy Policy | Terms of Service