A-Si-H Ambipolar Diffusion Length And Effective Lifetime Measured By Flying Spot Technique (Fst)

AuthID
 P-008-TZ9
5
Author(s)
VIEIRA, M
·
MARTINS, R
·
SOARES, F
·
GUIMARAES, L
5
Editor(s)
MADAN, A; HAMAKAWA, Y; THOMPSON, MJ; TAYLOR, PC; LECOMBER, PG
Document Type
Proceedings Paper
Year published
1991
Published
in AMORPHOUS SILICON TECHNOLOGY - 1991 in MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS
Volume: 219, Pages: 863-868 (6)
Conference
Symp At The 1991 Spring Meeting Of The Materials Research Soc : Amorphous Silicon Technology, Date: APR 30-MAY 01, 1991, Location: ANAHEIM, CA, Sponsors: MAT RES SOC
Indexing
Wos®
Google Scholar®
Publication Identifiers
Wos: WOS:A1991BU93V00130
Export Publication Metadata
Marked List
 Add to Marked List
Info
At this moment we don't have any links to full text documens.

A place for researchers and their institutions

Useful Links

Get Help

© 2024 CRACS & Inesc TEC - All Rights Reserved Privacy Policy | Terms of Service