Study of the Effect of Different Plasma-Enhanced Chemical Vapour Deposition Reactor Configurations on the Properties of Hydrogenated Amorphous Silicon Thin Films

AuthID
 P-001-0FW
5
Author(s)
Document Type
Article
Year published
2000
Published
in PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, ISSN: 0141-8637
Volume: 80, Issue: 4, Pages: 475-486 (12)
Conference
International Workshop on Semiconducting and Superconducting Materials, Date: FEB, 1999, Location: TURIN, ITALY
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Publication Identifiers
Wos: WOS:000086441200003
Source Identifiers
ISSN: 0141-8637
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