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Optoelectronic and Structural Properties of Amorphous Silicon-Carbon Alloys Deposited by Low-Power Electron-Cyclotron Resonance Plasma-Enhanced Chemical-Vapor Deposition

AuthID
P-001-4VD

Author(s)

Conde, JP

Chu, V

da Silva, MF

Dai, Z

Giorgis, F

Pirri, CF

Document Type

Article

Year published

1999

Published

in JOURNAL OF APPLIED PHYSICS, ISSN: 0021-8979

Volume: 85, Issue: 6, Pages: 3327-3338 (12)

Indexing

Wos^®

Scopus^®

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Google Scholar^®

Publication Identifiers

DOI: 10.1063/1.369679

Scopus: 2-s2.0-0000973683

Wos: WOS:000079021200048

Source Identifiers

ISSN: 0021-8979

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Optoelectronic and Structural Properties of Amorphous Silicon-Carbon Alloys Deposited by Low-Power Electron-Cyclotron Resonance Plasma-Enhanced Chemical-Vapor Deposition

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Optoelectronic and Structural Properties of Amorphous Silicon-Carbon Alloys Deposited by Low-Power Electron-Cyclotron Resonance Plasma-Enhanced Chemical-Vapor Deposition

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