Structural and Optoelectronic Properties of Amorphous and Microcrystalline Silicon Deposited at Low Substrate Temperatures by Rf and Hwcvd

AuthID
 P-001-5AS
3
Author(s)
·
5
Editor(s)
Branz,HM;Collins,RW;Okamoto,H;Guha,S;Schropp,R
Document Type
Proceedings Paper
Year published
1999
Published
in AMORPHOUS AND HETEROGENEOUS SILICON THIN FILMS: FUNDAMENTALS TO DEVICES-1999 in MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS, ISSN: 0272-9172
Volume: 557, Pages: 91-96 (6)
Conference
Symposium on Amorphous and Heterogeneous Silicon Thin Film - Fundamentals to Devices-1999 Held at the 1999 Mrs Spring Meeting, Date: APR 05-09, 1999, Location: SAN FRANCISCO, CA, Sponsors: Mat Res Soc, Akzo Nobel Chem & Coatings, Energy Convers Devices Inc, Fuji Elect Co, MVSyst Inc, Natl Renewable Energy Lab, Sanyo Elect Co, Solarex Corp, SONY Corp, United Solar Syst Corp, Voltaix Inc
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Publication Identifiers
Scopus: 2-s2.0-0033297458
Wos: WOS:000085825300014
Source Identifiers
ISSN: 0272-9172
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