Possible Origin of Large Response Times and Ambipolar Diffusion Lengths in Hot-Wire-Cvd Silicon Films

AuthID
P-001-8QD
5
Author(s)
5
Editor(s)
Schropp, R; Branz, HM; Hack, M; Shimizu, I; Wagner, S
Document Type
Proceedings Paper
Year published
1998
Published
in AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998 in Materials Research Society Symposium Proceedings, ISSN: 0272-9172
Volume: 507, Pages: 799-804 (6)
Conference
Symposium on Amorphous and Microcrystalline Silicon Technology-1998, at the Mrs Spring Meeting, Date: APR 14-17, 1998, Location: SAN FRANCISCO, CA, Sponsors: Mat Res Soc, Akzo Nobel, dpiX A Xerox Co, Fuji Elect Corp Res & Dev Ltd, Kaneka Corp, Mitsui Chem Co Ltd, NAPS France, Natl Renewable Energy Lab, Sanyo Elect Co Ltd, Tokuyama Corp, Voltaix Inc
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Publication Identifiers
Wos: WOS:000079335700123
Source Identifiers
ISSN: 0272-9172
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