Low Filament Temperature Deposition Of A-Si-H By Hot-Wire Chemical-Vapor-Deposition

AuthID
 P-001-GB7
4
Author(s)
Document Type
Article
Year published
1995
Published
in JOURNAL OF APPLIED PHYSICS, ISSN: 0021-8979
Volume: 78, Issue: 6, Pages: 3776-3783 (8)
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Publication Identifiers
Scopus: 2-s2.0-0000822378
Wos: WOS:A1995RU95300031
Source Identifiers
ISSN: 0021-8979
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