Fluorine Incorporation And Annealing Properties Of A-Si,Ge:h,F Alloys Studied By Elastic Proton Scattering And Ir Absorption.

AuthID
 P-00F-MMC
6
Author(s)
Okada, Y
·
Chou, SF
·
Kolodzey, J
·
Slobodin, D
·
Wagner, S
Document Type
Proceedings Paper
Year published
1986
Published
in Materials Research Society Symposia Proceedings, ISSN: 0272-9172
Volume: 70, Pages: 283-288
Conference
Materials Issues in Amorphous Semiconductor Technology., Location: Palo Alto, CA, USA, Sponsors: Materials Research Soc, Pittsburgh, PA, USA
Indexing
Scopus®
Publication Identifiers
Scopus: 2-s2.0-0022984468
Source Identifiers
ISSN: 0272-9172
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