High Rate Deposition of Highly Stable A-Si:h Films Using Multi-Hollow Discharges for Thin Films Solar Cells

AuthID
 P-00H-E1T
6
Author(s)
Nakamura, WM
·
Sato, H
·
Koga, K
·
Document Type
Article
Year published
2010
Published
in Surface and Coatings Technology, ISSN: 0257-8972
Volume: 205, Pages: S241-S245
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ISSN: 0257-8972
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