Origin Of Gas Impurities In Sputtering Plasmas During Thin-Film Deposition

AuthID
 P-001-R9M
1
Author(s)
Document Type
Article
Year published
1991
Published
in VACUUM, ISSN: 0042-207X
Volume: 42, Issue: 12, Pages: 753-756 (4)
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Publication Identifiers
Scopus: 2-s2.0-0025890895
Wos: WOS:A1991FP64600007
Source Identifiers
ISSN: 0042-207X
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