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Composition and Structure Variation for Magnetron Sputtered Tantalum Oxynitride Thin Films, as Function of Deposition Parameters

AuthID
P-00J-Y3R

Author(s)

Cristea, D

Patru, M

Crisan, A

Munteanu, D

Apreutesei, M

Document Type

Article

Year published

2015

Published

in APPLIED SURFACE SCIENCE, ISSN: 0169-4332

Volume: 358, Pages: 508-517 (10)

Conference

9Th International Conference on Materials Science and Engineering (Bramat), Date: MAR 05-07, 2015, Location: Transilvania Univ, Sergiu T Chiriacescu Aula, Brasov, ROMANIA, Host: Transilvania Univ, Sergiu T Chiriacescu Aula

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Publication Identifiers

DOI: 10.1016/j.apsusc.2015.09.022

Wos: WOS:000366220500002

Source Identifiers

ISSN: 0169-4332

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Composition and Structure Variation for Magnetron Sputtered Tantalum Oxynitride Thin Films, as Function of Deposition Parameters

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Composition and Structure Variation for Magnetron Sputtered Tantalum Oxynitride Thin Films, as Function of Deposition Parameters

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