Development of Electron Beam Resists Based on Amorphous Polyphenols with Low Molecular Weight and Narrow Dispersion

AuthID
 P-00T-9XF
12
Author(s)
Hirayama, T
·
Matsumaru, S
·
Ogata, T
·
Hada, H
·
Onodera, J
·
Arai, T
·
Yamaguchi, A
·
Shiraishi, H
·
Fukuda, H
·
Ueda, M
1
Editor(s)
John L.Sturtevant
Document Type
Proceedings Paper
Year published
2005
Published
in Advances in Resist Technology and Processing XXII
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