High-Performance and Industrially Viable Nanostructured Siox Layers for Interface Passivation in Thin Film Solar Cells

AuthID
P-00T-CNV
17
Author(s)
Oliveira, K
·
Lontchi, J
·
Lopes, TS
·
Curado, MA
·
Barbosa, JRS
·
Vinhais, C
·
Chen, WC
·
Borme, J
·
Fonseca, H
·
Gaspar, J
·
Flandre, D
·
Silva, AG
·
Document Type
Article in Press
Year published
2021
Published
in SOLAR RRL, ISSN: 2367-198X
Indexing
Publication Identifiers
Scopus: 2-s2.0-85099750008
Wos: WOS:000612038400001
Source Identifiers
ISSN: 2367-198X
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