191
TÍTULO: Fast and slow UV-photoresponse in n-type GaN
AUTORES: Rocha, R; Koynov, S; Brogueira, P ; Schwarz, R ; Chu, V ; Topf, M; Meister, D; Meyer, BK;
PUBLICAÇÃO: 1999, FONTE: Symposium on Wide-Bandgap Semiconductors for High-Power, High-Frequency and High-Temperature Applications-1999 at the 1999 MRS Spring Meeting in WIDE-BANDGAP SEMICONDUCTORS FOR HIGH-POWER, HIGH-FREQUENCY AND HIGH-TEMPERATURE APPLICATIONS-1999, VOLUME: 572
INDEXADO EM: Scopus WOS
192
TÍTULO: Possible origin of large response times and ambipolar diffusion lengths in hot-wire-CVD silicon films
AUTORES: Schwarz, R ; Murias, T; Conde, JP ; Brogueira, P ; Chu, V;
PUBLICAÇÃO: 1999, FONTE: Proceedings of the 1998 MRS Spring Meeting in Materials Research Society Symposium - Proceedings, VOLUME: 507
INDEXADO EM: Scopus
193
TÍTULO: Mobility-lifetime product in microdoped amorphous silicon deposited by hot-wipe chemical vapor deposition  Full Text
AUTORES: Conde, JP ; Castanha, R; Brogueira, P ; Chu, V ;
PUBLICAÇÃO: 1998, FONTE: 17th International Conference on Amorphous and Microcrystalline Semiconductors - Science and Technology (ICAMS 17) in JOURNAL OF NON-CRYSTALLINE SOLIDS, VOLUME: 227, NÚMERO: PART 1
INDEXADO EM: Scopus WOS CrossRef
194
TÍTULO: QCD structure of multiparticle production: quark and gluon jets
AUTORES: Brogueira, P ; de Deus, JD ; da Silva, IP;
PUBLICAÇÃO: 1998, FONTE: EUROPEAN PHYSICAL JOURNAL C, VOLUME: 2, NÚMERO: 2
INDEXADO EM: Scopus WOS CrossRef
195
TÍTULO: Amorphous and microcrystalline silicon deposited by low-power electron-cyclotron resonance plasma-enhanced chemical-vapor deposition
AUTORES: Conde, JP ; Schotten, V; Arekat, S; Brogueira, P ; Sousa, R; Chu, V ;
PUBLICAÇÃO: 1997, FONTE: JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, VOLUME: 36, NÚMERO: 1A
INDEXADO EM: Scopus WOS CrossRef
196
TÍTULO: Amorphous and microcrystalline silicon films obtained by hot-wire chemical vapour deposition using high filament temperatures between 1900 and 2500 degrees C
AUTORES: Conde, JP ; Brogueira, P ; Chu, V ;
PUBLICAÇÃO: 1997, FONTE: PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES, VOLUME: 76, NÚMERO: 3
INDEXADO EM: Scopus WOS CrossRef
197
TÍTULO: Amorphous silicon thin-film transistors with a hot-wire active-layer deposited at high growth rate
AUTORES: Chu, V ; Jarego, J; Silva, H; Silva, T; Boucinha, M; Brogueira, P ; Conde, JP ;
PUBLICAÇÃO: 1997, FONTE: Symposium on Amorphous and Microcrystalline Silicon Technology in AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY - 1997, VOLUME: 467
INDEXADO EM: Scopus WOS
198
TÍTULO: Doping of amorphous and microcrystalline silicon films deposited by hot-wire chemical vapor deposition using phosphine and trimethylboron
AUTORES: Brogueira, P ; Chu, V ; Ferro, AC ; Conde, JP ;
PUBLICAÇÃO: 1997, FONTE: JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, VOLUME: 15, NÚMERO: 6
INDEXADO EM: Scopus WOS CrossRef: 27
199
TÍTULO: Improved mobility of amorphous silicon thin-film transistors deposited by hot-wire chemical vapor deposition on glass substrates  Full Text
AUTORES: Chu, V ; Jarego, J; Silva, H; Silva, T; Reissner, M; Brogueira, P ; Conde, JP ;
PUBLICAÇÃO: 1997, FONTE: APPLIED PHYSICS LETTERS, VOLUME: 70, NÚMERO: 20
INDEXADO EM: Scopus WOS CrossRef
200
TÍTULO: Post-deposition annealing and hydrogenation of hot-wire amorphous and microcrystalline silicon films
AUTORES: Conde, JP ; Brogueira, P ; Chu, V ;
PUBLICAÇÃO: 1997, FONTE: Symposium Q on Advances in Microcrystalline and Nanocrystalline Semiconductors - 1996, at the 1996 MRS Fall Meeting in ADVANCES IN MICROCRYSTALLINE AND NANOCRYSTALLINE SEMICONDUCTORS - 1996, VOLUME: 452
INDEXADO EM: Scopus WOS
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