ProfileOfResearchers

NO MEU:

ORCID |

132

TÃTULO: Giant magnetoresistance behavior of granular Fe and Co implanted Ag thin films
AUTORES: Soares, JC ; Redondo, LM ; de Jesus, CM; Marques, JG ; da Silva, MF; de Azevedo, MMP; Mendes, JA ; Rogalski, MS; Sousa, JB ;
PUBLICAÇÃO: 1998, FONTE: 44th National Symposium of the American-Vacuum-Society in JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, VOLUME: 16, NÚMERO: 3

INDEXADO EM:

Scopus

WOS

NO MEU:

ORCID |

133

TÃTULO: High flux 56Fe+ and 57Fe+ implantations for GMR applications Full Text
AUTORES: Redondo, LM ; De Jesus, CM; Marques, JG ; Da Silva, MF; Soares, JC ; Pereira De Azevedo, MM; Mendes, JA ; Rogalski, MS; Sousa, JB ;
PUBLICAÇÃO: 1998, FONTE: Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms, VOLUME: 139, NÚMERO: 1-4

INDEXADO EM:

Scopus

NO MEU:

ORCID |

134

TÃTULO: High flux Fe-56(+) and Fe-57(+) implantations for GMR applications Full Text
AUTORES: Redondo, LM ; de Jesus, CM; Marques, JG ; da Silva, MF; Soares, JC; de Azevedo, MMP; Mendes, JA ; Rogalski, MS; Sousa, JB ;
PUBLICAÇÃO: 1998, FONTE: 5th European Conference on Accelerators in Applied Research and Technology (ECAART5) in NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, VOLUME: 139, NÚMERO: 1-4

INDEXADO EM:

WOS

NO MEU:

ORCID |

135

TÃTULO: Lattice site location of Hf in LiNbO3: Influence of dopant concentration and crystal stoichiometry Full Text
AUTORES: Marques, JG ; Kling, A ; Soares, JC ; Rebouta, L ; da Silva, MF; Dieguez, E; Agullo Lopez, F;
PUBLICAÇÃO: 1998, FONTE: 13th International Conference on Ion Beam Analysis (IBA-13) in NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, VOLUME: 136

INDEXADO EM:

Scopus

WOS

NO MEU:

ORCID |

136

TÃTULO: Microscopic studies of radioactive Hg implanted in YBa2Cu3O6+x superconducting thin films Full Text
AUTORES: Amaral, VS ; Correia, JG ; Lourenco, AACS; Marques, JG ; Mendes, JA ; Baptista, MA; Araujo, JP ; Moreira, JM; Sousa, JB ; Alves, E ; da Silva, MF; Soares, JC ;
PUBLICAÇÃO: 1998, FONTE: International Conference on Magnetism in JOURNAL OF MAGNETISM AND MAGNETIC MATERIALS, VOLUME: 177, NÚMERO: PART 1

INDEXADO EM:

Scopus

WOS

CrossRef: 4

NO MEU:

ORCID |

137

TÃTULO: Direct evidence for stability of tetrahedral interstitial Er in Si up to 900°C
AUTORES: Wahl, U ; Correia, JG ; Langouche, G; Marques, JG ; Vantomme, A;
PUBLICAÇÃO: 1997, FONTE: Materials Science Forum, VOLUME: 258-263, NÚMERO: 9993

INDEXADO EM:

Scopus

NO MEU:

ORCID |

138

TÃTULO: Direct evidence for tetrahedral interstitial Er in Si
AUTORES: Wahl, U ; Vantomme, A; DeWachter, J; Moons, R; Langouche, G; Marques, JG ; Correia, JG ;
PUBLICAÇÃO: 1997, FONTE: PHYSICAL REVIEW LETTERS, VOLUME: 79, NÚMERO: 11

INDEXADO EM:

Scopus

WOS

NO MEU:

ORCID |

139

TÃTULO: Lattice location of Hf in near-stoichiometric LiNbO3: RBS/channeling and PAC studies
AUTORES: Marques, JG ; Kling, A ; Rebouta, L ; DaSilva, MF; Melo, AA; Soares, JC ; Serrano, MD; Dieguez, E; AgulloLopez, F;
PUBLICAÇÃO: 1997, FONTE: International Symposium on Materials Science Applications of Ion Beam Techniques / 1st German/Australian Workshop on Ion Beam Analysis in MATERIALS SCIENCE APPLICATIONS OF ION BEAM TECHNIQUES, VOLUME: 248-2

INDEXADO EM:

Scopus

WOS

NO MEU:

ORCID |

140

TÃTULO: Lattice sites and damage annealing of implanted Tm and Er in Si
AUTORES: Wahl, U; Correia, JG ; De Wachter, J; Langouche, G; Marques, JG ; Moons, R; Vantomme, A;
PUBLICAÇÃO: 1997, FONTE: Symposium on Defects and Diffusion in Silicon Processing in DEFECTS AND DIFFUSION IN SILICON PROCESSING, VOLUME: 469

INDEXADO EM:

Scopus

WOS

CrossRef: 3

NO MEU:

ORCID |