Elvira Maria Correia Fortunato
AuthID: R-000-4M5
141
TÃTULO: Role of the collecting resistive layer on the static characteristics of 2D a-Si : H thin film position sensitive detector
AUTORES: Fortunato, E; Martins, R;
PUBLICAÇÃO: 1998, FONTE: Symposium on Amorphous and Microcrystalline Silicon Technology-1998, at the MRS Spring Meeting in AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, VOLUME: 507
AUTORES: Fortunato, E; Martins, R;
PUBLICAÇÃO: 1998, FONTE: Symposium on Amorphous and Microcrystalline Silicon Technology-1998, at the MRS Spring Meeting in AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, VOLUME: 507
INDEXADO EM: 
WOS
WOS NO MEU: ResearcherID
ResearcherID142
TÃTULO: Performances of nano/amorphous silicon films produced by hot wire plasma assisted technique
AUTORES: Ferreira, I; Aguas, H; Mendes, L; Fernandes, F ; Fortunato, E; Martins, R;
PUBLICAÇÃO: 1998, FONTE: Symposium on Amorphous and Microcrystalline Silicon Technology-1998, at the MRS Spring Meeting in AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, VOLUME: 507
AUTORES: Ferreira, I; Aguas, H; Mendes, L; Fernandes, F ; Fortunato, E; Martins, R;
PUBLICAÇÃO: 1998, FONTE: Symposium on Amorphous and Microcrystalline Silicon Technology-1998, at the MRS Spring Meeting in AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, VOLUME: 507
INDEXADO EM: WOS
WOS NO MEU: ResearcherID
ResearcherID143
TÃTULO: Influence of the H-2 dilution and filament temperature on the properties of P doped silicon carbide thin films produced by hot-wire technique
AUTORES: Ferreira, I; Aguas, H; Mendes, L; Fernandes, F; Fortunato, E; Cenimat, RM;
PUBLICAÇÃO: 1998, FONTE: Symposium on Amorphous and Microcrystalline Silicon Technology-1998, at the MRS Spring Meeting in AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, VOLUME: 507
AUTORES: Ferreira, I; Aguas, H; Mendes, L; Fernandes, F; Fortunato, E; Cenimat, RM;
PUBLICAÇÃO: 1998, FONTE: Symposium on Amorphous and Microcrystalline Silicon Technology-1998, at the MRS Spring Meeting in AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY-1998, VOLUME: 507
INDEXADO EM: WOS
WOS NO MEU: ResearcherID
ResearcherID144
TÃTULO: A NEW WEAKLY ABSORBING AND HIGHLY CONDUCTIVE (MU-C-SIX-CY-OZ-H) MATERIAL PRODUCED BY A TCDDC SYSTEM
AUTORES: WILLEKE, G; MARTINS, R; VIEIRA, M; FORTUNATO, E; FERREIRA, I; SANTOS, M; MACARICO, A; CARVALHO, N; GUIMARAES, L;
PUBLICAÇÃO: 1990, FONTE: 1989 CONGRESS OF THE INTERNATIONAL SOLAR ENERGY SOC : CLEAN AND SAFE ENERGY FOREVER in CLEAN AND SAFE ENERGY FOREVER, VOLS 1-3
AUTORES: WILLEKE, G; MARTINS, R; VIEIRA, M; FORTUNATO, E; FERREIRA, I; SANTOS, M; MACARICO, A; CARVALHO, N; GUIMARAES, L;
PUBLICAÇÃO: 1990, FONTE: 1989 CONGRESS OF THE INTERNATIONAL SOLAR ENERGY SOC : CLEAN AND SAFE ENERGY FOREVER in CLEAN AND SAFE ENERGY FOREVER, VOLS 1-3
INDEXADO EM: WOS
WOS NO MEU: ResearcherID
ResearcherID145
TÃTULO: Transport in μc-Six:Cy:Oz:H films prepared by a TCDDC system Full Text
AUTORES: Martins, R; Willeke, G; Fortunato, E; Ferreira, I; Vieira, M; Santos, M; Maçarico, A; Guimarães, L;
PUBLICAÇÃO: 1989, FONTE: Journal of Non-Crystalline Solids, VOLUME: 114
AUTORES: Martins, R; Willeke, G; Fortunato, E; Ferreira, I; Vieira, M; Santos, M; Maçarico, A; Guimarães, L;
PUBLICAÇÃO: 1989, FONTE: Journal of Non-Crystalline Solids, VOLUME: 114
