Role of Trimethylboron to Silane Ratio on the Properties of P-Type Nanocrystalline Silicon Thin Film Deposited by Radio Frequency Plasma Enhanced Chemical Vapour Deposition

AuthID
 P-003-7YA
5
Author(s)
Bernacka Wojcik, I
·
Tipo de Documento
Article
Year published
2010
Publicado
in JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, ISSN: 1533-4880
Volume: 10, Número: 4, Páginas: 2547-2551 (5)
Conference
2Nd International Conference on Advanced Nano Materials, Date: 2008, Location: Aveiro, PORTUGAL, Host: Univ Aveiro
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Publication Identifiers
SCOPUS: 2-s2.0-77954980837
Wos: WOS:000273984900039
Source Identifiers
ISSN: 1533-4880
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