Carboxylic Acids as Oxygen Supplying Agents for Atomic Layer Deposition of High-Kappa Thin Films

AuthID
 P-004-2MN
7
Author(s)
Ducroquet, F
·
Matko, I
·
6
Editor(es)
Londergan, A; Bent, SF; DeGendt, S; Elam, JW; Kang, SB; VanderStraten, O
Tipo de Documento
Proceedings Paper
Year published
2008
Publicado
in ATOMIC LAYER DEPOSITION APPLICATIONS 4 in ECS Transactions, ISSN: 1938-5862
Volume: 16, Número: 4, Páginas: 279-289 (11)
Conference
4Th Symposium on Atomic Layer Deposition Applications Held at the 214Th Meeting of the Electrochemical-Society, Date: OCT 13-15, 2008, Location: Honolulu, HI, Patrocinadores: Electrochem Soc
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Publication Identifiers
SCOPUS: 2-s2.0-63149192783
Wos: WOS:000272018400029
Source Identifiers
ISSN: 1938-5862
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