Role of Substrate Temperature During Diamond Film Growth Using the Newly Developed Time-Modulated Chemical Vapor Deposition Process

AuthID
 P-000-FWJ
5
Author(s)
Tipo de Documento
Article
Year published
2003
Publicado
in JOURNAL OF MATERIALS SCIENCE LETTERS, ISSN: 0261-8028
Volume: 22, Número: 14, Páginas: 1039-1042 (4)
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Publication Identifiers
SCOPUS: 2-s2.0-0041696626
Wos: WOS:000184172600016
Source Identifiers
ISSN: 0261-8028
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