Properties of Tantalum Oxynitride Thin Films Produced by Magnetron Sputtering: The Influence of Processing Parameters

AuthID
 P-006-67P
10
Author(s)
Cristea, D
·
Constantin, D
·
Crisan, A
·
·
Tipo de Documento
Article
Year published
2013
Publicado
in VACUUM, ISSN: 0042-207X
Volume: 98, Páginas: 63-69 (7)
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Publication Identifiers
SCOPUS: 2-s2.0-84885419245
Wos: WOS:000322805900013
Source Identifiers
ISSN: 0042-207X
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