Effect of Deposition Conditions and Dielectric Plasma Treatments on the Electrical Properties of Microcrystalline Silicon Tfts

AuthID
 P-008-YGC
8
Author(s)
Kasouit, S
·
Roca i Cabarrocas, P
·
Vanderhaghen, R
·
Bonassieux, Y
·
French, I
·
1
Editor(es)
Roca i Cabarrocas PFortunato GRobertson JStutzmann M
Tipo de Documento
Proceedings Paper
Year published
2003
Publicado
in Thin Solid Films, ISSN: 0040-6090
Volume: 427, Número: 1-2, Páginas: 67-70
Conference
E-Mrs, K, Date: 18 June 2003 through 21 June 2003, Location: Strasbourg
Indexing
Scopus®
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Google Scholar®
Publication Identifiers
SCOPUS: 2-s2.0-0037416733
Source Identifiers
ISSN: 0040-6090
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