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A New Polarised Hot Filament Chemical Vapor Deposition Process for Homogeneous Diamond Nucleation on Si(100)

AuthID
P-009-0N2

Author(s)

Cojocaru, CS

Larijani, M

Misra, DS

Singh, MK

Veis, R

Le Normand, F

Tipo de Documento

Article

Year published

2004

Publicado

in DIAMOND AND RELATED MATERIALS, ISSN: 0925-9635

Volume: 13, Número: 2, Páginas: 270-276 (7)

Conference

Symposium on Carbon Materials for Active Electronics Held at the Spring Meeting of the European-Materials-Research-Society, Date: JUN 10-13, 2003, Location: Strasbourg, FRANCE, Patrocinadores: European Mat Res Soc

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Fontes

Publication Identifiers

DOI: 10.1016/j.diamond.2003.10.076

SCOPUS: 2-s2.0-1542348310

Wos: WOS:000220043200011

Source Identifiers

ISSN: 0925-9635

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A New Polarised Hot Filament Chemical Vapor Deposition Process for Homogeneous Diamond Nucleation on Si(100)

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A New Polarised Hot Filament Chemical Vapor Deposition Process for Homogeneous Diamond Nucleation on Si(100)

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