Lattice Location and Annealing Behaviour of Pt and W Implanted Sapphire

AuthID
 P-001-627
4
Author(s)
da Silva, RC
·
da Silva, MF
·
Tipo de Documento
Article
Year published
1999
Publicado
in NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, ISSN: 0168-583X
Volume: 147, Número: 1-4, Páginas: 226-230 (5)
Conference
Symposium J on Ion Implantation into Semiconductors, Oxides and Ceramics, at the Spring Meeting of the European-Materials-Research-Society, Date: JUN 16-19, 1998, Location: STRASBOURG, FRANCE, Patrocinadores: European Mat Res Soc
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Publication Identifiers
SCOPUS: 2-s2.0-0032757259
Wos: WOS:000077846200040
Source Identifiers
ISSN: 0168-583X
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