- Publicações
- Pesquisar
- Estatísticas
Role of the Gas Flow Parameters on the Uniformity of Films Produced by Pecvd Technique
AuthID
P-001-C5M
P-001-C5M
4
Author(s)
5
Editor(es)
Wagner, S; Hack, M; Schiff, EA; Schropp, R; Shimizu, I
Tipo de Documento
Proceedings Paper
Year published
1997
Publicado
in AMORPHOUS AND MICROCRYSTALLINE SILICON TECHNOLOGY - 1997 in MATERIALS RESEARCH SOCIETY SYMPOSIUM PROCEEDINGS, ISSN: 0272-9172
Volume: 467, Páginas: 609-614 (6)
Conference
Symposium on Amorphous and Microcrystalline Silicon Technology, Date: MAR 31-APR 04, 1997, Location: SAN FRANCISCO, CA, Patrocinadores: Mat Res Soc, Canon Corp, dpiX, A Xerox Co, Elect Power Res Inst, Fuji Elect Corp Res, Mitsui Toatsu Chem, MV Syst Inc, NAPS France, UNI SOLAR, Sanyo Elect Co, Sharp Ccorp, Solarex Crp, Voltaix Inc
Publication Identifiers
SCOPUS: 2-s2.0-0031351337
Wos: WOS:000071462000091
Source Identifiers
ISSN: 0272-9172
Export Publication Metadata
Publication Export Settings
Lista Marked
Citações
Oops! It looks like you don't have access to this content.
This section is restricted to uses with b-on access.
CORE Conference
No information about CORE Rank
During the preprocessing phase, only publications of type 'Proceedings Paper' or 'Proceedings' are automatically processed to identify their CORE Rank.
TIP: If your publication's CORE Rank is missing, you can contact with your institutional manager to have the correct ranking manually added to the record.
Journal Factors
Oops! It looks like you don't have access to this content.
This section is restricted to uses with b-on access.
Info
At this moment we don't have any links to full text documens.