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Dependence of Ga-Doped Zno Thin Film Properties on Different Sputtering Process Parameters: Substrate Temperature, Sputtering Pressure and Bias Voltage

AuthID
P-00G-3PS

Author(s)

Castro, MV

Tavares, CJ

Tipo de Documento

Article

Year published

2015

Publicado

in THIN SOLID FILMS, ISSN: 0040-6090

Volume: 586, Páginas: 13-21 (9)

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Publication Identifiers

DOI: 10.1016/j.tsf.2015.04.036

SCOPUS: 2-s2.0-84928983064

Wos: WOS:000353984000003

Source Identifiers

ISSN: 0040-6090

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Dependence of Ga-Doped Zno Thin Film Properties on Different Sputtering Process Parameters: Substrate Temperature, Sputtering Pressure and Bias Voltage

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Dependence of Ga-Doped Zno Thin Film Properties on Different Sputtering Process Parameters: Substrate Temperature, Sputtering Pressure and Bias Voltage

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