Study of the Effect of Different Plasma-Enhanced Chemical Vapour Deposition Reactor Configurations on the Properties of Hydrogenated Amorphous Silicon Thin Films

AuthID
 P-00H-NNM
5
Author(s)
águas, H
·
Document Type
Article
Year published
2000
Published
in Philosophical Magazine Part B, ISSN: 1364-2812
Volume: 80, Issue: 4, Pages: 475-486
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ISSN: 1364-2812
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