Study of the Effect of Different Plasma-Enhanced Chemical Vapour Deposition Reactor Configurations on the Properties of Hydrogenated Amorphous Silicon Thin Films

AuthID
 P-00H-NNM
5
Author(s)
Silva V.
·
Ferreira I.
·
Tipo de Documento
Article
Year published
2000
Publicado
in Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties, ISSN: 1364-2812
Volume: 80, Número: 4, Páginas: 475-486 (11)
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Publication Identifiers
SCOPUS: 2-s2.0-85023702136
Source Identifiers
ISSN: 1364-2812
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