Interpreting Anomalies Observed in Oxide Semiconductor Tfts Under Negative and Positive Bias Stress

AuthID
 P-00K-V3Y
7
Author(s)
Jin, JW
·
Nathan, A
·
Tipo de Documento
Article
Year published
2016
Publicado
in AIP ADVANCES, ISSN: 2158-3226
Volume: 6, Número: 8, Páginas: 085321 (8)
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Wos®
Scopus®
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Google Scholar®
Publication Identifiers
SCOPUS: 2-s2.0-84984677284
Wos: WOS:000383909100086
Source Identifiers
ISSN: 2158-3226
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