Toggle navigation
Publicações
Investigadores
Instituições
0
Entrar
Autenticação Federada
(Click on the image)
Autenticação local
Recuperação de Password
Register
Entrar
Publicações
Procurar
Estatísticas
Generic Distortion Model for Metrology Under Optical Microscopes
AuthID
P-00N-GDX
6
Author(s)
Liu, XJ
·
Li, ZW
·
Zhong, K
·
Chao, YJ
·
Miraldo, P
·
Shi, YS
Document Type
Article
Year published
2018
Published
in
OPTICS AND LASERS IN ENGINEERING,
ISSN: 0143-8166
Volume: 103, Pages: 119-126 (8)
Indexing
Wos
®
Scopus
®
Google Scholar
®
Metadata
Sources
Publication Identifiers
DOI
:
10.1016/j.optlaseng.2017.12.006
Scopus
: 2-s2.0-85038023354
Wos
: WOS:000423895500014
Source Identifiers
ISSN
: 0143-8166
Export Publication Metadata
Export
×
Publication Export Settings
BibTex
EndNote
APA
Export Preview
Lista
Marked
Adicionar à lista
Marked
Info
At this moment we don't have any links to full text documens.
×
Select Source
This publication has:
2 records from
ISI
2 records from
SCOPUS
2 records from
DBLP
2 records from
Unpaywall
Please select which records must be used by Authenticus!
×
Preview Publications
© 2024 CRACS & Inesc TEC - All Rights Reserved
Privacy Policy
|
Terms of Service