Properties of Crn Thin Films Deposited in Plasma-Activated Abs by Reactive Magnetron Sputtering

AuthID
 P-00P-HBK
11
Author(s)
Pedrosa, P
·
Rodrigues, MS
·
Ferreira, A
·
Godinho, LH
·
Carvalho, S
·
Tipo de Documento
Article
Year published
2018
Publicado
in SURFACE & COATINGS TECHNOLOGY, ISSN: 0257-8972
Volume: 349, Páginas: 858-866 (9)
Conference
45Th International Conference on Metallurgical Coatings and Thin Films (Icmctf), Date: APR 23-27, 2018, Location: San Diego, CA
Indexing
Wos®
Scopus®
Crossref®11
Google Scholar®
Publication Identifiers
SCOPUS: 2-s2.0-85049338544
Wos: WOS:000441492600089
Source Identifiers
ISSN: 0257-8972
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