Silicon Nitride Based Devices: Lithographic Mask Roughness Mitigation

AuthID
 P-00S-CAX
4
Author(s)
Lourenço, P
·
3
Editor(es)
Baets,RG;O'Brien,P;Vivien,L
Tipo de Documento
Proceedings Paper
Year published
2020
Publicado
in Proceedings of SPIE - The International Society for Optical Engineering, ISSN: 0277-786X
Volume: 11364
Conference
Integrated Photonics Platforms 2020: Fundamental Research, Manufacturing and Applications, Date: 6 April 2020 through 10 April 2020, Patrocinadores: City of Strasbourg;CNRS;et al.;Eurometropole;Region Grand Est;The Society of Photo-Optical Instrumentation Engineers (SPIE)
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Publication Identifiers
SCOPUS: 2-s2.0-85087092688
Source Identifiers
ISSN: 0277-786X
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