Silicon Nitride Based Devices: Lithographic Mask Roughness Mitigation

AuthID
 P-00T-2FF
4
Author(s)
Lourenco, P
·
Fantoni, A
·
Costa, J
·
3
Editor(es)
Baets,RG;OBrien,P;Vivien,L
Tipo de Documento
Proceedings Paper
Year published
2020
Publicado
in INTEGRATED PHOTONICS PLATFORMS: FUNDAMENTAL RESEARCH, MANUFACTURING AND APPLICATIONS in Proceedings of SPIE, ISSN: 0277-786X
Volume: 11364
Conference
Conference on Integrated Photonics Platforms - Fundamental Research, Manufacturing and Applications, Date: APR 06-10, 2020, Location: ELECTR NETWORK, Patrocinadores: SPIE, Eurometropole, CNRS, ICube, Univ Strasbourg
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Publication Identifiers
Wos: WOS:000589999800022
Source Identifiers
ISSN: 0277-786X
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