Publicações

Silicon Nitride Based Devices: Lithographic Mask Roughness Mitigation

AuthID
P-00T-2FF

Author(s)

Lourenco, P

Fantoni, A

Costa, J

Vieira, M

Editor(s)

Baets, RG; OBrien, P; Vivien, L

Document Type

Proceedings Paper

Year published

2020

Published

in INTEGRATED PHOTONICS PLATFORMS: FUNDAMENTAL RESEARCH, MANUFACTURING AND APPLICATIONS in Proceedings of SPIE, ISSN: 0277-786X

Volume: 11364

Conference

Conference on Integrated Photonics Platforms - Fundamental Research, Manufacturing and Applications, Date: APR 06-10, 2020, Location: ELECTR NETWORK, Sponsors: SPIE, Eurometropole, CNRS, ICube, Univ Strasbourg

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Publication Identifiers

DOI: 10.1117/12.2555564

Wos: WOS:000589999800022

Source Identifiers

ISSN: 0277-786X

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