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In Situ Annealing Behavior of Cu Thin Films Deposited over Co-W Diffusion Barrier Layers
AuthID
P-00X-78F
3
Author(s)
Oliveira, BMC
·
Santos, RF
·
Vieira, MF
Document Type
Article
Year published
2022
Published
in
APPLIED SCIENCES-BASEL,
ISSN: 2076-3417
Volume: 12, Issue: 19, Pages: 9778 (10)
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DOI
:
10.3390/app12199778
Scopus
: 2-s2.0-85139903464
Unpaywall
: 10.3390/app12199778
Wos
: WOS:000866613900001
Source Identifiers
ISSN
: 2076-3417
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