Short Pulse Plasma Immersion Ion Implantation of Oxygen into Silicon: Determination of the Energy Distribution

AuthID
 P-001-AVT
4
Author(s)
Mandl, S
·
Gunzel, R
Document Type
Article
Year published
1997
Published
in SURFACE & COATINGS TECHNOLOGY, ISSN: 0257-8972
Volume: 93, Issue: 2-3, Pages: 238-241 (4)
Conference
3Rd International Workshop on Plasma-Based Ion Implantation, Date: SEP 15-18, 1996, Location: DRESDEN, GERMANY, Sponsors: Res Ctr Rossendorf, Dresden, State Saxony, Saxonian Minist Sci & Arts, Dresden, AP & T Adv Prod & Technol GmbH, Nurtingen, Germany, DANFYSIK, Jyllinge, Denmark, Hiden Anal, Ried, Germany, Leybold Serv GmbH, Dresden, N Star Res Corp, Albuquerque, NM, Roth & Rau Oberfiachentech GmbH, Wustenbrand, Germany, SASKIA Hochvakuum GmbH, Ilmenau, Germany, SENTECH, Berlin
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Publication Identifiers
Scopus: 2-s2.0-0031219764
Wos: WOS:A1997YH79800016
Source Identifiers
ISSN: 0257-8972
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